Electron Microscopy Unit
Electron Microscopy Unit
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VP-FESEM[ Variable Pressure Field Emission Remotely Operationable FESEM ]
Scanning electron microscopy permits the observation and characterization of materials on a nanometer to micrometer scale. SEM is popular because it can deliver a three dimensional image of the surface of a very wide range of materials. It is not too expensive to use and has a range of applications. Several types of signal are generated by the interaction of the electron beam with the material, and these include secondary electrons (topography), backscattered electrons (differentiation and phase diffraction) and characteristic x-ray (composition).
The Schottky eschottky field-emission source of electrons. The schottky emitter combines the high brightness and low energy spread of the cold field emitter with the high stability and low beam noise of thermal emitters. The instrument is equipped with about 100 times the emitting area as a cold emitter, and as a result, has much higher probe currents that give it an advantage for analytical applications. The electron gun is directly linked to a beam booster. This linkage eliminates, among other things, the crossover of electrons along the beam path, which aids in operating at very low beam.

LEO's unique variable pressure technology makes the LEO SUPRA 50VP the most versatile analytical FESEM currently available. The LEO SUPRA 50VP allows simultaneous EDS and WDS in high vacuum mode. The variable pressure mode adds the advantage of analyzing insulating specimens. The short working distance allows simultaneous acquisition of EDS, WDS, SE, BSD, CL and specimen current signals. The extended performance of the GEMINI column delivers ample beam current for the most demanding WDS analysis.

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